In situ measurement of the crystallization of amorphous silicon in a vertical furnace using spectroscopic ellipsometry

By Petrik P.   Lehnert W.   Schneider C.   Lohner T.   Fried M.   Gyulai J.   Ryssel H.  

Thin Solid Films, Vol. 383, Iss. 1, 2001-02 ,pp. : 235-240

Elsevier

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In situ spectroscopic ellipsometry for the characterization of polysilicon formation inside a vertical furnace

By Petrik P.   Lehnert W.   Schneider C.   Fried M.   Lohner T.   Gyulai J.   Ryssel H.  

Thin Solid Films, Vol. 364, Iss. 1, 2000-03 ,pp. : 150-155

Elsevier

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In situ monitoring of MOVPE growth by combined spectroscopic ellipsometry and reflectance-difference spectroscopy

By Ebert M.   Bell K.A.   Yoo S.D.   Flock K.   Aspnes D.E.  

Thin Solid Films, Vol. 364, Iss. 1, 2000-03 ,pp. : 22-27

Elsevier

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In-situ spectroscopic ellipsometry for monitoring the Ti&unknown;Si multilayers during growth and annealing

By Logothetidis S.   Alexandrou I.   Vouroutzis N.  

Thin Solid Films, Vol. 275, Iss. 1, 1996-04 ,pp. : 44-47

Elsevier

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Monitoring photodeposition of polymer films from diacetylene monomer solutions using in situ real-time spectroscopic ellipsometry

By Hui D.   Kim J.-S.   Kim Y.-T.   An I.   Paley M.S.  

Thin Solid Films, Vol. 437, Iss. 1, 2003-08 ,pp. : 127-134

Elsevier

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