In situ measurement of the crystallization of amorphous silicon in a vertical furnace using spectroscopic ellipsometry

By Petrik P.   Lehnert W.   Schneider C.   Lohner T.   Fried M.   Gyulai J.   Ryssel H.  

Thin Solid Films, Vol. 383, Iss. 1, 2001-02 ,pp. : 235-240

Elsevier

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In situ spectroscopic ellipsometry in vertical furnace: monitoring and control of high-temperature processes

By Petrik P.   Schneider C.  

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Atomic scale characterization of semiconductors by in-situ real time spectroscopic ellipsometry

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Thin Solid Films, Vol. 318, Iss. 1, 1998-04 ,pp. : 120-123

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In situ characterization of thin Si 1-x Ge x films on Si(100) by spectroscopic ellipsometry

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Thin Solid Films, Vol. 369, Iss. 1, 2000-07 ,pp. : 157-160

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In situ spectroscopic ellipsometry for plasma-carburising process

By Moritani A.   Yamada T.   Kitamura T.   Katayama H.   Noda Y.   Kanayama N.  

Thin Solid Films, Vol. 374, Iss. 2, 2000-10 ,pp. : 298-302

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