Author: Faber J. Hotzsch G. Metzner C.
Publisher: Elsevier
ISSN: 0042-207X
Source: Vacuum, Vol.64, Iss.1, 2001-11, pp. : 55-63
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
SiO 2 etching characteristics in DC magnetron plasmas by using an external magnetic field
By Yamada H. Kuwahara K. Fujiyama H.
Thin Solid Films, Vol. 316, Iss. 1, 1998-03 ,pp. :
On the dynamics of unipolar and bipolar pulsed d.c. discharges used for plasma CVD
Vacuum, Vol. 71, Iss. 1, 2003-05 ,pp. :
ITO coating by reactive magnetron sputtering-comparison of properties from DC and MF processing
Thin Solid Films, Vol. 351, Iss. 1, 1999-08 ,pp. :
Low ohm large area ITO coating by reactive magnetron sputtering in DC and MF mode
Vacuum, Vol. 59, Iss. 2, 2000-11 ,pp. :