![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Author: Lobl H.P. Huppertz M.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.317, Iss.1, 1998-04, pp. : 153-156
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Aluminium nitride thin films deposited by DC reactive magnetron sputtering
By Dimitrova V. Manova D. Paskova T. Uzunov T. Ivanov N. Dechev D.
Vacuum, Vol. 51, Iss. 2, 1998-10 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Deposition and properties of nickel oxide films produced by DC reactive magnetron sputtering
By Hotovy I. Huran J. Janik J. Kobzev A.P.
Vacuum, Vol. 51, Iss. 2, 1998-10 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Study of reactive DC magnetron sputtering deposition of AlN thin films
By Dechev D.A. Dimitrova V.I. Manova D.I.
Vacuum, Vol. 49, Iss. 3, 1998-03 ,pp. :