Dependence on substrate temperature of the film structure of c-Si:H prepared by RF magnetron sputtering

Author： Kondo J.   Tabata A.   Kawamura T.   Mizutani T.  

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.66, Iss.3, 2002-08, pp. : 409-413

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