Masked ion damage and implantation for device fabrication

Author： Blamire M.G. Kang D.-J. Burnell G. Peng N.H. Webb R. Jeynes C. Yun J.H. Moon S.H. Oh B.

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.69, Iss.1, 2002-12, pp. : 11-15

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