Generation of Si nanocrystals by ion implantation utilizing a LIS device

Author: Velardi L.   Lorusso A.   Nassisi V.   Congedo G.  

Publisher: Taylor & Francis Ltd

ISSN: 1042-0150

Source: Radiation Effects and Defects in Solids, Vol.163, Iss.4-6, 2008-04, pp. : 491-496

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Abstract