LPCVD-silicon oxynitride films: low-temperature annealing effects

Author: Alexandrova S.   Szekeres A.   Halova E.   Modreanu M.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.69, Iss.1, 2002-12, pp. : 385-389

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Abstract