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Thin Solid Films, Vol. 322, Iss. 1, 1998-06 ,pp. : 37-40

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Characterization of carbon nitride thin films deposited by a combined RF and DC plasma beam

By Dinescu G.   Aldea E.   Musa G.   van de Sanden M.C.M.   de Graaf A.   Ghica C.   Gartner M.   Andrei A.  

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Microstructure and semiconducting properties of c-BN films using r.f. plasma CVD thermally assisted by a tungsten filament

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Optical characterization of hydrogenated amorphous carbon (a-C:H) thin films deposited from methane plasma

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Diamond-like carbon films grown in a new configuration for filament enhanced plasma assisted CVD

By Dehbi-Alaoui A.   Matthews A.  

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