Author: Wang C. Yu X. Yu J. Meng H.
Publisher: Elsevier
ISSN: 0042-207X
Source: Vacuum, Vol.71, Iss.4, 2003-07, pp. : 451-457
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
An ellipsometric study of W thin films deposited on Si
By Deineka A.G. Tarasenko A.A. Jastrabk L. Chvostova D. Bousek J.
Thin Solid Films, Vol. 339, Iss. 1, 1999-02 ,pp. :
Microstructure Study on Cuprous Oxide Thin Films Deposited on
Materials Science Forum, Vol. 2014, Iss. 803, 2015-01 ,pp. :
Study of the growth mechanisms of chromium nitride films deposited by vacuum ARC evaporation
Thin Solid Films, Vol. 295, Iss. 1, 1997-02 ,pp. :
Auger electron spectroscopy study of SiC thin films deposited on silicon
By Lei Y.M. Yu Y.H. Cheng L.L. Ren C.X. Zou S.C.
Vacuum, Vol. 58, Iss. 4, 2000-09 ,pp. :