Characterization of silicon oxynitride thin films deposited by electron beam physical vapor deposition technique

Author: Mohite K.C.   Khollam Y.B.   Mandale A.B.   Patil K.R.   Takwale M.G.  

Publisher: Elsevier

ISSN: 0167-577X

Source: Materials Letters, Vol.57, Iss.26, 2003-09, pp. : 4170-4175

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content