Electron cyclotron resonance plasma etching of materials for magneto-resistive random access memory applications

Author： Jung K. Lee J. Park Y. Childress J. Pearton S. Jenson M. Hurst A.

ISSN： 1543-186X

Source： Journal of Electronic Materials, Vol.26, Iss.11, 1997-11, pp. : 1310-1313

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