Nanoimprinting ultrasmall and high-aspect-ratio structures by using rubber-toughened UV cured epoxy resist

Author: Young Jae Shin   Wu Yi-Kuei   Guo L Jay  

Publisher: IOP Publishing

ISSN: 0957-4484

Source: Nanotechnology, Vol.24, Iss.25, 2013-06, pp. : 255302-255308

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Abstract