Characteristics of High- k ZrO 2 Gate Dielectrics on O 2 /N 2 O Plasma Treated Si 0.69 Ge 0.3 C 0.01 /Si Heterolayers

Author： Mahapatra R.   Maikap S.   Dhar A.   Mathur B.   Ray S.  

Publisher： Taylor & Francis Ltd

ISSN： 0015-0193

Source： Ferroelectrics, Vol.329, Iss.1, 2005-01, pp. : 101-105

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