Adhesion studies of radio-frequency sputtered SiO2 films on Ti, stainless steel, Ni and Inconel substrates. Effects of substrate surface ion bombardment etching

Author: Lee G.H.  

Publisher: Taylor & Francis Ltd

ISSN: 1568-5616

Source: Journal of Adhesion Science and Technology, Vol.4, Iss.1, 1990-01, pp. : 481-501

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