Thermodynamic Approach to Optimization of SrTiO₃ Chemical Vapor Deposition from Volatile Metalorganic Precursors

By  

Inorganic Materials, Vol. 40, Iss. 5, 2004-05 ,pp. : 516-521

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Recent Advances in Chemical Vapor Deposition

By  

Current Organic Chemistry, Vol. 10, Iss. 9, 2006-06 ,pp. : 1021-1033

Bentham Science Publishers

Access to resources Recommend Favorite

Thermogravimetric Study of Volatile Precursors For Chemical Thin Film Deposition: Estimation of vapor pressures and source temperatures

By Niskanen A.   Hatanpää T.   Ritala M.   Leskelä M.  

Journal of Thermal Analysis and Calorimetry, Vol. 64, Iss. 3, 2001-06 ,pp. : 955-964

Springer Publishing Company

Access to resources Recommend Favorite

Thermodynamic Modeling of BC_xN_y Chemical Vapor Deposition in the B–C–N–H System

By Golubenko A.N.   Kosinova M.L.   Titov A.A.   Kuznetsov F.A.  

Inorganic Materials, Vol. 39, Iss. 4, 2003-04 ,pp. : 362-365

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Structure of Chemical Vapor Deposition Titania/Silica Gel

By Leboda R.   Gun'ko V.M.   Marciniak M.   Malygin A.A.   Malkin A.A.   Grzegorczyk W.   Trznadel B.J.   Pakhlov E.M.   Voronin E.F.  

Journal of Colloid and Interface Science, Vol. 218, Iss. 1, 1999-10 ,pp. : 23-39

Academic Press

Access to resources Recommend Favorite