Pressure instability and hysteresis effect in reactive sputtering of TiN

By Precht W.   Czyzniewski A.   Reszka K  

International Journal of Materials and Product Technology, Vol. 8, Iss. 2-4, 1993-11 ,pp. : 282-289

Inderscience Publishers

Access to resources Recommend Favorite

Characterization of Ti-Zr-N coating films by reactive sputtering method

By Iwamoto Nobuya   Murakami Yoshihiko  

International Journal of Materials and Product Technology, Vol. 8, Iss. 2-4, 1993-11 ,pp. : 188-193

Inderscience Publishers

Access to resources Recommend Favorite

Preparation and Characterization of BaTiO₃ Thin Films Using Reactive Sputtering Method with Metal Target

By Osumi Tsuyoshi   Nishide Masamichi   Funakubo Hiroshi   Shima Hiromi   Nishida Ken   Yamamoto Takashi  

Integrated Ferroelectrics, Vol. 133, Iss. 1, 2012-01 ,pp. : 42-48

Taylor & Francis Ltd

Access to resources Recommend Favorite

Investigation of Antireflection Nb₂O₅ Thin Films by the Sputtering Method under Different Deposition Parameters

By Chen Kun-Neng   Hsu Chao-Ming   Liu Jing   Liou Yu-Chen   Yang Cheng-Fu  

Micromachines, Vol. 7, Iss. 9, 2016-09 ,pp. : 151-151

MDPI

Access to resources Recommend Favorite

Thermodynamic model of reactive sputtering process

By Faddeeva S   Oseguera J  

Surface Engineering, Vol. 28, Iss. 9, 2012-10 ,pp. : 639-645

Maney Publishing

Access to resources Recommend Favorite