A new approach to silicon wafer edge treatment by Ultrasonically Assisted Polishing (UAP)

Author: Yang Weiping   Wu Yongbo   Kato Masana  

Publisher: Inderscience Publishers

ISSN: 0268-1900

Source: International Journal of Materials and Product Technology, Vol.31, Iss.2-3, 2008-04, pp. : 159-175

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract