Enhancing the dry-etch durability of photoresist masks: A review of the main approaches

Author： Zelentsov S.   Zelentsova N.   Kolesov A.   Bogatyreva L.   Mashtakov I.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7397

Source： Russian Microelectronics, Vol.36, Iss.1, 2007-02, pp. : 40-48

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