Deposition process, microstructure and mechanical behaviours of RF magnetron sputtered (Ti,Al)N thin films

Author： Yang H. S.   Lu Y. H.   He X.   Xiong X. T.   Qiao L. J.   Wang Y. B.  

Publisher： Maney Publishing

ISSN： 1743-2847

Source： Materials Science and Technology, Vol.24, Iss.11, 2008-11, pp. : 1299-1303

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Relationship between composition, bonding constitution and microstructure in unbalanced magnetron sputtered Ti–B–N thin films

By Lu Y. H.   Shen Y. G.   Li K. Y.  

Surface Engineering, Vol. 23, Iss. 4, 2007-07 ,pp. : 307-312

Maney Publishing

Access to resources Recommend Favorite

Tribological characterisation of magnetron sputtered Ti(C, O, N) thin films

By Olteanu C.   Munteanu D.   Ionescu C.   Munteanu A.   Chappe J.M.   Cunha L.   Vaz F.  

International Journal of Materials and Product Technology, Vol. 39, Iss. 1-2, 2010-07 ,pp. : 186-194

Inderscience Publishers

Access to resources Recommend Favorite

Role of substrate bias during deposition of magnetron sputtered Ni, Ti and Ni-Ti thin films

By Priyadarshini B G   Kumar Gupta M   Ghosh S   Chakraborty M   Aich S  

Surface Engineering, Vol. 29, Iss. 9, 2013-10 ,pp. : 689-694

Maney Publishing

Access to resources Recommend Favorite

Deposition of Ti-Si-N films on Al substrates by magnetron sputtering

By Pang J   Bai Y   Qin F   Pan L   Zhao Y   Kang R  

Surface Engineering, Vol. 29, Iss. 10, 2013-11 ,pp. : 749-754

Maney Publishing

Access to resources Recommend Favorite

High Temperature Oxidation of TiAlN Thin Films for Memory Devices

By Park Sang-Shik   Yoon Soon-Gil  

Integrated Ferroelectrics, Vol. 48, Iss. 1, 2002-01 ,pp. : 281-290

Taylor & Francis Ltd

Access to resources Recommend Favorite