Stochastic Models for Pad Structure and Pad Conditioning Used in Chemical-Mechanical Polishing

Author: Wiegand Susanne   Stoyan Dietrich  

Publisher: Springer Publishing Company

ISSN: 0022-0833

Source: Journal of Engineering Mathematics, Vol.54, Iss.4, 2006-04, pp. : 333-343

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract