Deposition of CNx thin films by plasma-activated chemical vapour deposition using various precursors as carbon source

Author： Gruger H.   Selbmann D.   Wolf E.   Leonhardt A.  

Publisher： Springer Publishing Company

ISSN： 0022-2461

Source： Journal of Materials Science, Vol.32, Iss.11, 1997-11, pp. : 2849-2853

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