The effect of input gas ratio on the growth behavior of chemical vapor deposited SiC films

Author: Oh J-H.   Oh B-J.   Choi D-J.   Kim G-H.   Song H-S.  

Publisher: Springer Publishing Company

ISSN: 0022-2461

Source: Journal of Materials Science, Vol.36, Iss.7, 2001-04, pp. : 1695-1700

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Abstract