Growth behavior and surface topography of different silane coupling agents adsorbed on the silicon dioxide substrate (0001) for vapor phase deposition

Author: Cai Chujiang   Shen Zhigang   Ma Shulin   Xing Yushan  

Publisher: Springer Publishing Company

ISSN: 0022-2461

Source: Journal of Materials Science, Vol.42, Iss.15, 2007-08, pp. : 6108-6116

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