Etching Mechanism of Pb(Zr,Ti)O3 Thin Films in Cl2/Ar Plasma

Author: Efremov A.M.   Kim D.P.   Kim K.T.   Kim C.I.  

Publisher: Springer Publishing Company

ISSN: 0272-4324

Source: Plasma Chemistry and Plasma Processing, Vol.24, Iss.1, 2004-03, pp. : 13-28

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Abstract