Electron Number Density Measurements in Ar and Ar-N₂ Inductively Coupled Plasmas

By Montaser Akbar   Fassel Velmer A.  

Applied Spectroscopy, Vol. 36, Iss. 6, 1982-11 ,pp. : 613-617

Society for Applied Spectroscopy

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A Critical Comparison of Ar and Ar-N₂ Inductively Coupled Plasmas as Excitation Sources for Atomic Emission Spectrometry

By Montaser Akbar   Fassel V. A.   Zalewski J.  

Applied Spectroscopy, Vol. 35, Iss. 3, 1981-05 ,pp. : 292-302

Society for Applied Spectroscopy

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Numerical Modeling of an Ar–H₂ Radio-Frequency Plasma Reactor under Thermal and Chemical Nonequilibrium Conditions

By Ye Rubin   Murphy Anthony   Ishigaki Takamasa  

Plasma Chemistry and Plasma Processing, Vol. 27, Iss. 2, 2007-04 ,pp. : 189-204

Springer Publishing Company

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Prominent Spectral Lines for Analytical Atomic Emission Spectrometry with an Ar-N₂ Inductively Coupled Plasma

By Montaser Akbar   Chan Shi-Kit   Huse G. R.   Vieira P. A.   Van Hoven R. L.  

Applied Spectroscopy, Vol. 40, Iss. 4, 1986-05 ,pp. : 473-477

Society for Applied Spectroscopy

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An Analysis of Low Frequency Discharge in a CH₃SiCl₃-Ar-H₂ Mixture by Optical Emission Spectroscopy and Actinometry

By Kułakowska-Pawlak Barbara   Jamróz Piotr  

Plasma Chemistry and Plasma Processing, Vol. 30, Iss. 5, 2010-10 ,pp. : 641-661

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