Author: Shan Yanguang Mostaghimi Javad
Publisher: Springer Publishing Company
ISSN: 0272-4324
Source: Plasma Chemistry and Plasma Processing, Vol.25, Iss.3, 2005-06, pp. : 193-214
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
By Jain Ricky Girshick Steven Heberlein Joachim Mukherjee Rajesh Zhang Bin Nakamura Toshitaka Mochizuki Amane
Plasma Chemistry and Plasma Processing, Vol. 30, Iss. 6, 2010-12 ,pp. :