Author: Bernardelli E. Belmonte T. Duday D. Frache G. Poncin-Epaillard F. Noël C. Choquet P. Migeon H.-N. Maliska A.
Publisher: Springer Publishing Company
ISSN: 0272-4324
Source: Plasma Chemistry and Plasma Processing, Vol.31, Iss.1, 2011-02, pp. : 205-215
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Abstract