Interaction Mechanisms Between Ar–O₂ Post-Discharge and Stearic Acid I: Behaviour of Thin Films

Author： Bernardelli E. Belmonte T. Duday D. Frache G. Poncin-Epaillard F. Noël C. Choquet P. Migeon H.-N. Maliska A.

ISSN： 0272-4324

Source： Plasma Chemistry and Plasma Processing, Vol.31, Iss.1, 2011-02, pp. : 189-203

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