Etch Characteristics of Ferroelectric (Bi4−xLax)Ti3O12 Thin Films in an Inductively Coupled Plasma

By Yoon Jin Koo   Byun Yo Han   Song Young Soo   Chung Chee Won   Lee June Key  

Integrated Ferroelectrics, Vol. 48, Iss. 1, 2002-01 ,pp. : 239-244

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Ferroelectric Characteristics of Bi4−xLaxTi3O12 Thin Films Crystallized at Low Temperetures

By Tanaka K.   Uno T.   Shimada Y.  

Integrated Ferroelectrics, Vol. 46, Iss. 1, 2002-01 ,pp. : 285-294

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Leakage Current Suppression of Pt/Bi4-xLaxTi3O12/Ru Capacitors by Post-Annealing of Ru Films

By FURUKAWA T.   KUROIWA T.   FUJISAKI Y.   SATO T.   ISHIWARA H.  

Integrated Ferroelectrics, Vol. 62, Iss. 1, 2004-01 ,pp. : 171-176

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Ferroelectric Properties of Mo-Doped Bi4-XLaXTi3O12 Films

By OHKI HIROSHI   WANG XUSHENG   ISHIWARA HIROSHI  

Integrated Ferroelectrics, Vol. 61, Iss. 1, 2004-01 ,pp. : 37-42

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Preparation and Properties of V-Doped (Bi,Nd)4Ti3O12 Ferroelectric Thin Films by Chemical Solution Deposition Method

By HAYASHI TAKASHI   IIZAWA NAOYA   TOGAWA DAICHI   YAMADA MIO   SAKAMOTO WATARU   KIKUTA KOICHI   YOGO TOSHINOBU   HIRANO SHIN-ICHI  

Integrated Ferroelectrics, Vol. 62, Iss. 1, 2004-01 ,pp. : 233-241

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