Comparison of Materials for the Ferroelectric Thin Film to be Integrated into High Density FeRAMs

Author: BRUCHHAUS R.   MOON B.-K.   HILLIGER A.   NAGEL N.   YAMADA Y.   ITOKAWA H.   YAMAKAWA K.   KUNISHIMA I.   BEITEL G.  

Publisher: Taylor & Francis Ltd

ISSN: 1058-4587

Source: Integrated Ferroelectrics, Vol.64, Iss.1, 2004-01, pp. : 115-124

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