ELECTRICAL CHARACTERIZATION OF NICKEL OXIDE THIN FILMS DEPOSITED BY REACTIVE SPUTTERING FOR MEMORY APPLICATIONS

Author: LEE JANG   PARK IK   CHUNG CHEE  

Publisher: Taylor & Francis Ltd

ISSN: 1058-4587

Source: Integrated Ferroelectrics, Vol.74, Iss.1, 2005-09, pp. : 71-77

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Abstract