BORON DIFFUSION PROPERTIES AND ELECTRICAL CHARACTERISTICS OF p + Poly-Si 0.73 Ge 0.27 /AlN x /Al 2 O 3 /AlN x /n-Si (100) USING IN-SITU ALD

Author： LEE CHIHOON HWANG CHEOL KIM HYEONG

Publisher： Taylor & Francis Ltd

ISSN： 1058-4587

Source： Integrated Ferroelectrics, Vol.74, Iss.1, 2005-09, pp. : 79-85

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