Chemical Vapor Deposition Precursors for High Dielectric Oxides: Zirconium and Hafnium Oxide

Author: Walawalkar Mrinalini   Kottantharayil Anil   Rao V. Ramgopal  

Publisher: Taylor & Francis Ltd

ISSN: 1553-3174

Source: Synthesis and Reactivity in Inorganic, Metal-Organic, and Nano-Metal Chemistry, Vol.39, Iss.6, 2009-07, pp. : 331-340

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