Comparison between N2 and O2 anneals on the integrity of an Al2O3/Si3N4/SiO2/Si memory gate stack

Author： Yu-Qiong Chu   Man-Hong Zhang   Zong-Liang Huo   Ming Liu  

Publisher： IOP Publishing

ISSN： 1674-1056

Source： Chinese Physics B, Vol.23, Iss.8, 2014-08, pp. : 88501-88505

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