Fast control unit for electron beam lithography Systems especiallyfor X-ray and EUV optics

By  

Le Journal de Physique IV, Vol. 104, Iss. issue, 2003-03 ,pp. : 203-205

Edp Sciences

Access to resources Recommend Favorite

Fabrication of ordered GaAs nanowhiskers using electron-beam lithography

By Soshnikov I.   Afanas'ev D.   Cirlin G.   Petrov V.   Tanklevskaya E.   Samsonenko Yu.   Bouravlev A.   Khrebtov A.   Ustinov V.  

Semiconductors, Vol. 45, Iss. 6, 2011-06 ,pp. : 822-827

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Generation And Applications Of Electron-Beam Plasma Flows

By  

Journal of Physics: Conference Series , Vol. 591, Iss. 1, 2015-03 ,pp. : 395-399

IOP Publishing

Access to resources Recommend Favorite

Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography

By Erdmann Andreas   Shao Feng   Agudelo Viviana   Fuhner Tim   Evanschitzky Peter  

Journal of Modern Optics, Vol. 58, Iss. 5-6, 2011-03 ,pp. : 480-495

Taylor & Francis Ltd

Access to resources Recommend Favorite

Sensing Performance of Precisely Ordered TiO₂ Nanowire Gas Sensors Fabricated by Electron-Beam Lithography

By Tian Wei-Cheng   Ho Yu-Hsuan   Chen Chao-Hao   Kuo Chun-Yen  

Sensors, Vol. 13, Iss. 1, 2013-01 ,pp. : 865-874

MDPI

Access to resources Recommend Favorite