Interaction of SF6 and O2 plasma with porous poly phenyl methyl silsesquioxane low-κ films

E-ISSN： 1361-6463|48|12|125201-125209

ISSN： 0022-3727

Source： Journal of Physics D: Applied Physics, Vol.48, Iss.12, 2015-04, pp. : 125201-125209

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Investigation of O₂ and SF₆ plasma interactions on thermally stable damage resistant poly phenyl-methyl silsesquioxane low-k films

By Cherunilam J F Rajani K V McCoy A Heise A Daniels S

Journal of Physics D: Applied Physics, Vol. 47, Iss. 10, 2014-03 ,pp. : 105204-105208

IOP Publishing

Access to resources Recommend Favorite

Preparation of Ultra Low-κ Porous SiOCH Films from Ring-Type Siloxane with Unsaturated Hydrocarbon Side Chains by Spin-On Deposition

By Chun-Xiao Yang Chi Zhang Qing-Qing Sun Sai-Sheng Xu Li-Feng Zhang Yu Shi Shi-Jin Ding Wei Zhang

Chinese Physics Letters, Vol. 27, Iss. 2, 2010-02 ,pp. : 27701-27703

IOP Publishing

Access to resources Recommend Favorite

Characteristics of dual-frequency capacitively coupled SF₆/O₂ plasma and plasma texturing of multi-crystalline silicon

By Dong-Sheng Xu Shuai Zou Yu Xin Xiao-Dong Su Xu-Sheng Wang

Chinese Physics B, Vol. 23, Iss. 6, 2014-06 ,pp. : 65201-65209

IOP Publishing

Access to resources Recommend Favorite

Amorphous hydrogenated carbon films treated by SF6 plasma

Journal of Physics: Conference Series , Vol. 167, Iss. 1, 2009-05 ,pp. : 267-270

IOP Publishing

Access to resources Recommend Favorite

Temperature variations in an SF6-N2 mixture arc plasma

Revue de Physique Appliquée (Paris), Vol. 22, Iss. 11, 1987-11 ,pp. : 1411-1417

Edp Sciences

Access to resources Recommend Favorite