Characteristics of dual-frequency capacitively coupled SF₆/O₂ plasma and plasma texturing of multi-crystalline silicon

Author： Dong-Sheng Xu Shuai Zou Yu Xin Xiao-Dong Su Xu-Sheng Wang

ISSN： 1674-1056

Source： Chinese Physics B, Vol.23, Iss.6, 2014-06, pp. : 65201-65209

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

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