Micro‐Raman spectroscopy as a complementary technique to high resolution X‐ray diffraction for the characterization of Si1‐xGex thin layers

Publisher： John Wiley & Sons Inc

E-ISSN： 1610-1642|12|3|304-309

ISSN： 1862-6351

Source： PHYSICA STATUS SOLIDI (C) - CURRENT TOPICS IN SOLID STATE PHYSICS, Vol.12, Iss.3, 2015-03, pp. : 304-309

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