A simulation analysis of performance of both implanted doping and in situ doping ETSOI PMOSFETs

Author: Shuai Feng   Lichuan Zhao   Qingzhu Zhang   Pengpeng Yang   Zhaoyun Tang   Cinan Wu   Jiang Yan  

Publisher: IOP Publishing

ISSN: 1674-4926

Source: Journal of Semiconductors, Vol.36, Iss.4, 2015-04, pp. : 46001-46005

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Abstract