Impact of Band-Engineering to Performance of High-k Multilayer Based Charge Trapping Memory

Publisher: IOP Publishing

E-ISSN: 1741-3540|32|8|88501-88504

ISSN: 0256-307X

Source: Chinese Physics Letters, Vol.32, Iss.8, 2015-01, pp. : 88501-88504

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract