Structural, chemical and electrical properties of ALD‐grown HfxAl1–xOy thin films for MIM capacitors

Publisher： John Wiley & Sons Inc

E-ISSN： 1521-3951|252|4|701-708

ISSN： 0370-1972

Source： PHYSICA STATUS SOLIDI (B) BASIC SOLID STATE PHYSICS, Vol.252, Iss.4, 2015-04, pp. : 701-708

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