Low-power rf plasma sources for technological applications: I. Plasma sources without a magnetic field

Author： Vavilin K.   Rukhadze A.   Ri M.   Plaksin V.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7842

Source： Technical Physics, Vol.49, Iss.5, 2004-05, pp. : 565-571

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Low-power inductive RF plasma sources for technological applications

By Vavilin K.   Rukhadze A.   Ri M.   Plaksin V.  

Plasma Physics Reports, Vol. 30, Iss. 8, 2004-08 ,pp. : 687-697

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Low-Power RF plasma sources for technological applications: III. helicon plasma sources

By Vavilin K.   Rukhadze A.   Ri Kh.   Plaksin V.  

Technical Physics, Vol. 49, Iss. 6, 2004-06 ,pp. : 691-697

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Low-power RF plasma sources for technological applications: II. plasma sources under anomalous skin effect conditions

By Vavilin K.   Plaksin V.   Ri Kh.   Rukhadze A.  

Technical Physics, Vol. 49, Iss. 6, 2004-06 ,pp. : 686-690

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Cracking of selected hydrocarbon gases in a low-power, low-pressure RF plasma

By Jiao Charles Q   Ganguly Biswa N   Garscadden Alan  

Plasma Sources Science and Technology, Vol. 20, Iss. 1, 2011-02 ,pp. : 15013-15018

IOP Publishing

Access to resources Recommend Favorite

Pulsed operation of low-power plasma thruster

By Bugrova A.   Desyatskov A.   Korobkin Yu.   Lipatov A.   Kharchevnikov V.  

Technical Physics Letters, Vol. 36, Iss. 10, 2010-10 ,pp. : 889-891

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite