Author: Venediktov V.
Publisher: MAIK Nauka/Interperiodica
ISSN: 1063-7842
Source: Technical Physics, Vol.52, Iss.1, 2007-01, pp. : 126-128
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
EUV source design flexibility for lithography
Journal of Physics: Conference Series , Vol. 112, Iss. 4, 2008-05 ,pp. :
EUV lithography: technology for the semiconductor industry in 2010
EPN Europhysics news, Vol. 35, Iss. 5, 2010-03 ,pp. :
Electron-beam lithography simulation for EUV mask applications
Journal of Physics: Conference Series , Vol. 10, Iss. 1, 2005-01 ,pp. :
Applications of short wavelength radiation : Soft X-ray microscopy and EUV lithography
Le Journal de Physique IV, Vol. 11, Iss. PR2, 2001-07 ,pp. :