Investigation of profiles of implanted Ti atoms over the depth of boron nitride nanocrystalline ceramic exposed to high radiation doses and fluxes with subsequent annealing

Author： Duvanov S.   Baturin V.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7850

Source： Technical Physics Letters, Vol.25, Iss.8, 1999-08, pp. : 615-617

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