Investigation and optimization of the magnetic field configuration in high-power impulse magnetron sputtering

Author: Yu He   Meng Liang   Szott Matthew M   McLain Jake T   Cho Tae S   Ruzic David N  

Publisher: IOP Publishing

ISSN: 0963-0252

Source: Plasma Sources Science and Technology, Vol.22, Iss.4, 2013-08, pp. : 45012-45021

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