Simulation of hydrogen diffusion and boron passivation in crystalline silicon

Author: Velichko O I   Shaman Yu P   Kovaliova A P  

Publisher: IOP Publishing

ISSN: 0965-0393

Source: Modelling and Simulation in Materials Science and Engineering, Vol.22, Iss.3, 2014-04, pp. : 35003-35014

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next