Electron beam-treated organic monolayers as a negative resist for Cu immersion plating on Si

Author： Balaur E.   Zhang Y.   Djenizian T.   Schmuki P.  

Publisher： Springer Publishing Company

ISSN： 1432-8488

Source： Journal of Solid State Electrochemistry, Vol.8, Iss.10, 2004-09, pp. : 772-777

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