Properties of ITO films prepared by reactive magnetron sputtering

Author： Kleinhempel Ronny   Kaune Gunar   Herrmann Matthias   Kupfer Hartmut   Hoyer Walter   Richter Frank  

Publisher： Springer Publishing Company

ISSN： 0026-3672

Source： Microchimica Acta, Vol.156, Iss.1-2, 2006-11, pp. : 61-67

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