Related content

Ex situ and in situ spectroscopic ellipsometry of MF and DC-sputtered TiO 2 and SiO 2 films for process control

By Vergohl M.   Malkomes N.   Staedler T.   Matthee T.   Richter U.  

Thin Solid Films, Vol. 351, Iss. 1, 1999-08 ,pp. : 42-47

Elsevier

Access to resources Recommend Favorite

Structural and Spectroscopic Properties of δ‐Y2Si2O7 Nanopowders Activated with Nd3+ Ions

By  

INTERNATIONAL JOURNAL OF APPLIED CERAMIC TECHNOLOGY, Vol. 12, Iss. 5, 2015-09 ,pp. : 1016-1019

John Wiley & Sons Inc

Access to resources Recommend Favorite

Effect of r.f. hydrogen plasma annealing on the properties of Si/SiO 2 interface: a spectroscopic ellipsometry study

By Paneva A.   Szekeres A.  

Thin Solid Films, Vol. 433, Iss. 1, 2003-06 ,pp. : 367-370

Elsevier

Access to resources Recommend Favorite

The sensitivity limits of spectroscopic ellipsometry to oxygen content in YBa 2 Cu 3 O 7- thin films

By Gibbons B.J.   Trolier-McKinstry S.  

Thin Solid Films, Vol. 352, Iss. 1, 1999-09 ,pp. : 205-212

Elsevier

Access to resources Recommend Favorite

Spectroscopic ellipsometry investigation of V 2 O 5 nanocrystalline thin films

By Losurdo M.   Barreca D.   Bruno G.   Tondello E.  

Thin Solid Films, Vol. 384, Iss. 1, 2001-03 ,pp. : 58-64

Elsevier

Access to resources Recommend Favorite